New class of materials for optical power limiting

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3146, Issue , 1997, Pages 152-159

  Casstevens, Martin K ^a   Burzynski, Ryszard ^a   Weibel, John F ^a   Spangler, Charles W ^b   He, Guang S ^c   Prasad, Paras N ^c  

^a Laser Photonics Technology Inc   (United States)

^b MONTANA STATE UNIVERSITY   (United States)

^c UNIVERSITY AT BUFFALO   (United States)

Author keywords

Catiomc absorption; Charge transfer; Optical power limiting; Two photon absorption

Indexed keywords

ABSORPTION; CHARGE TRANSFER; ION EXCHANGE; LIQUIDS; MASS TRANSFER; PHOTONS; SULFUR COMPOUNDS;

CATIOMC ABSORPTION; CHARGE STATES; ELECTRON ACCEPTORS; NEW CLASS; OPTICAL POWER LIMITING; RESPONSE TIMES; TWO PHOTON ABSORPTION;

MATERIALS;

EID: 0010584793     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284161     Document Type: Conference Paper

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