Contamination charging up effect in a variably shaped electron beam writer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6426-6428

  Ando, Atsushi ^a   Sunaoshi, Hitoshi ^a   Sato, Shinji ^a   Magoshi, Shunko ^a   Hattori, Kiyoshi ^a   Suenaga, Machiko ^a   Wada, Hirotsugu ^a   Housai, Hiroaki ^a   Hashimoto, Susumu ^a   Sugihara, Kazuyoshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Beam drift; Electron beam writer; Secondary electron; Shaping deflector; Variably shaped beam

Indexed keywords

EID: 0010366474     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6426     Document Type: Article

References (4)

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2. A. Ando, H. Sunaoshi, K. Hattori, H. Wada, R. Yoshikawa, K. Sugihara and S. Nishimura: Ext. Abstr. (The 56th Autumn Meeting,1995); The Japan Society of Applied Physics, p. 564.
3. M. Ogasawara, K. Ohtoshi and K. Sugihara: Jpn. J. Appl. Phys. 34 (1995) 6655.
4. J. Kato, H. Morita, K. Saito and N. Shimazu: J. Vac. Sci. & Techol. B 13 (1995) 2450.