Thin stacked oxide/nitride/oxide dielectrics formation by in situ multiple reactive rapid thermal processing

Applied Physics Letters

Volumn 55, Issue 22, 1989, Pages 2313-2315

  Ting, W ^a   Lin, S N ^a   Kwong, D L ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010284202     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.102359     Document Type: Article

References (9)