A new self-aligned process for fabrication of microemitter arrays using selective etching of silicon

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6632-6636

  Asano, Tanemasa ^a   Yasuda, Junji ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Electron source; Etch stop; Field emitter array; Silicon micromachining

Indexed keywords

EID: 0010152917     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6632     Document Type: Article

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