Spectroellipsometric method for process monitoring semiconductor thin films and interfaces

Applied Optics

Volumn 37, Issue 22, 1998, Pages 5145-5149

  Kildemo, Morten ^a   Brenot, Romain ^a   Drévillon, Bernard ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010001838     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.005145     Document Type: Article

References (11)

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