Sharpening Si field emitter tips, by dry etching and low temperature plasma oxidation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3697-3701

  Rakhshandehroo, M R ^a   Pang, S W ^a  

^a The Department of Civil and Environmental Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009874472     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588650     Document Type: Article

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