Rapid thermal oxidation of thin nitride/oxide stacked layer

Applied Physics Letters

Volumn 54, Issue 5, 1989, Pages 430-432

  Chang, W T ^a   Shih, D K ^a   Kwong, D L ^a   Zhou, Y ^a   Lee, S ^b  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b NCR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009717017     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.100942     Document Type: Article

References (16)