Ru and RuO2 Thin Films by XPS

Surface Science Spectra

Volumn 6, Issue 1, 1999, Pages 68-74

  Kaga, Yukinao ^a   Abe, Yoshio ^a   Yanagisawa, Hideto ^a   Kawamura, Midori ^a   Sasaki, Katsutaka ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; DYNAMIC RANDOM ACCESS STORAGE; FERROELECTRIC MATERIALS; FERROELECTRICITY; RUTHENIUM COMPOUNDS; X RAY DETECTORS; X RAY PHOTOELECTRON SPECTROSCOPY;

ARGON ATMOSPHERES; DYNAMIC RANDOM ACCESS MEMORY; ELECTRODE MATERIAL; LOW RESISTIVITY; METAL TARGET; MONOCHROMATICS; OXYGEN ATMOSPHERE; THERMAL AND CHEMICAL STABILITIES; THIN-FILMS; XPS SPECTRUM;

THIN FILMS;

EID: 0009715833     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/1.1247890     Document Type: Article

References (2)

1. JCPDS-International Centre of Diffraction Data, PDF-2 Database CD-ROM Version, No. 6-663 and No. 40-1290 (1996).
2. Y.Kaga, Y.Abe, H.Yanagisawa, and K.Sasaki, Jpn. J. Appl. Phys. 37, 3457 (1998). 10.1143/JJAP.37.3457