Low-Temperature Chemical Vapor Deposition of Ruthenium Dioxide from Ruthenium Tetroxide: A Simple Approach to High-Purity RuO2 Films

Chemistry of Materials

Volumn 5, Issue 7, 1993, Pages 908-910

  Yuan, Zheng ^a   Puddephatt, Richard J ^a   Sayer, Michael ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b QUEEN S UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009479914     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm00031a004     Document Type: Article

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