Thermal desorption of Si clusters from Si and Si-deposited Ta surfaces

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 5, 1997, Pages 1613-1617

  Tanaka, Hideyuki ^a,b,c   Kanayama, Toshihiko ^a,d,e  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

^b Angstrom Technology Partnership   (Japan)

^c Matsushita Research Institute Tokyo Inc   (Japan)

^d NATL INST FOR ADV INTERDISC RES   (Japan)

^e ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009420422     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589558     Document Type: Article

References (13)

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