Deep levels of chromium in 4H-SiC 1

Materials Science and Engineering B

Volumn 46, Issue 1-3, 1997, Pages 333-335

  Achtziger, Norbert ^a   Witthuhn, Wolfgang ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Chromium; Deep levels; Silicon carbide; Vanadium

Indexed keywords

ANNEALING; CHROMIUM; DEEP LEVEL TRANSIENT SPECTROSCOPY; ION IMPLANTATION; RADIOISOTOPES; VANADIUM;

CHEMICAL IDENTIFICATION;

SILICON CARBIDE;

EID: 0009374395     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)02000-4     Document Type: Article

References (16)

1. J. Schneider and K. Maier, Physica, B185 (1993) 199.
2. J.R. Jenny, M. Skowronski, W.C. Mitchel, H.M. Hobgood, R.C. Glass, G. Augustine and H.R. Hopkins, J. Appl. Phys., 78 (6) (1995) 3839.
3. N.T. Son, E. Sörman, W.M. Chen, O. Kordina, B. Monemar and E. Janzen, Appl. Phys. Lett., 65 (21) 2687.
4. P. Blood and J.W. Orton, The Electrical Characterization of Semiconductors: Majority Carriers and Electron States, Academic Press, London, 1992, p. 375.
5. J.W. Petersen and J. Nielsen, Appl. Phys. Lett., 56 (12) (1990) 1122.
6. M. Lang, G. Pensl, M. Gebhard, N. Achtziger and M. Uhrmacher, Appl. Phys., A53 (1991) 94.
7. N. Achtziger and W. Witthuhn, Phys. Rev. Lett., 75 (24) (1995) 4484.
8. N. Achtziger, H. Gottschalk, T. Licht, J. Meier and M. Rüb, U. Reislöhner and W. Witthuhn, Appl. Phys. Lett., 66 (1995) 2370.
9. J.L. Hartke, J. Appl. Phys., 39 (1968) 4871.
10. N. Achtziger et al., to be published.
11. A.L. Barry, B. Lehmann, D. Fritsch and D. Bräuning, IEEE Trans. Nucl. Sci., 38 (6) (1991) 1111.
12. J. Wong, T. Diaz de la Rubia, M.W. Guinan, M. Tobin, J.M. Perlado, A.S. Perez and J. Sanz, J. Nucl. Marter., 212-215 (1994) 143.
13. A. Uddin, H. Mitsuhashi and Tsutomo Uemoto, Jpn. J. Appl. Phys., 33 (1994) L908.
14. A.O. Evwaraye, S.R. Smith and W.C. Mitchel, Appl. Phys. Lett., 67 (22) (1995) 3319.
15. K.F. Dombrowski, U. Kaufmann, M. Kunzer, K. Maier, J. Schneider, V.B. Shields and M.G. Spencer, Appl. Phys. Lett., 65 (14) (1994) 1811.
16. J.R. Jenny, J. Skowronski, W.C. Mitchel, H.M. Hobgood, R.C. Glass, G. Augustine and H.R. Hopkins, Appl. Phys. Lett., 68 (14) (1996) 1963.