Allowance for apparatus distortions in modeling the structure of langmuir-blodgett films from reflectivity data

Kristallografiya

Volumn 41, Issue 4, 1996, Pages 629-634

  Konovalov, O V ^a   Feigin, L A ^a   Shchedrin, B M ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009292677     PISSN: 00234761     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

1. Parratt L.G. Phys. Rev. 1954. V. 95. No 2. P. 359.
2. Hamley I.W., Pedersen J.S., J. Appl. Cryst. 1994. V. 27. P. 29.
3. Penfold J., Thomas R.K. J. Phys. Condens. Matter. 1990. V. 2. P. 1369.
4. Pomerantz M., Segmuller A. Thin Solid Films. 1980. V. 68. P. 33.
5. Nicklow R.M., Pomerantz M., Segmuller A. Phys. Rev. B. 1981. V. 23. No 3. P. 1081.
6. Als-Nielsen J. Topics in Current Physics. 1987. V. 43. P. 181.
7. Pershan P.S. Faraday Discuss. Chem. Soc. 1990. V. 89. P. 231.
8. Als-Nielsen J., H. Mohwald. Handbook on Synchrotron Radiation. Amsterdam: North-Holland, 1991. V. 4. P. 1.
9. Sinha S.K., Sirota E.B., Garoff S., Stanley H.B. Phys. Rev. B. 1988. V. 38. P. 2297.
10. Konovalov O.V. Feigin L.A. J. de Phys. IV. Colloq. C8. Suppl. J. de Phys. I. 1993. V. 3. P. 185.