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Volumn 2966, Issue , 1997, Pages 72-79
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Pulse-length dependence of absorptance and degradation rate of fused silica at 248 nm
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Author keywords
Degradation; Fused silica; KrF excimer; Two photon absorption; UV lithography
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Indexed keywords
ABSORPTION;
COLOR CENTERS;
DEGRADATION;
EXCIMER LASERS;
GAS LASERS;
KRYPTON;
LASER APPLICATIONS;
LASER DAMAGE;
LASER PULSES;
LASER RESONATORS;
LASERS;
LIGHT ABSORPTION;
LITHOGRAPHY;
LUMINESCENCE OF ORGANIC SOLIDS;
MULTIPHOTON PROCESSES;
OPTICAL MATERIALS;
OXIDES;
PHOTONS;
POINT DEFECTS;
PULSED LASER APPLICATIONS;
RESONATORS;
SEMICONDUCTOR LASERS;
SILICA;
ABSORPTANCE;
ABSORPTION CHANGES;
APPLICATIONS.;
DEGRADATION RATES;
DEGRADATION STUDIES;
DO-MAINS;
EXTENSION UNITS;
KRF EXCIMER;
LASER CLEANINGS;
LENGTH DEPENDENCES;
OPTICAL COMPONENTS;
OPTICAL PULSES;
PULSE DURATIONS;
PULSE LENGTHS;
REPETITION RATES;
SEMICONDUCTOR LITHOGRAPHIES;
TWO-PHOTON ABSORPTION;
UV - LITHOGRAPHY;
FUSED SILICA;
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EID: 0009272092
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.274232 Document Type: Conference Paper |
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Times cited : (2)
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References (11)
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