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Applied Physics Letters
Volumn 63, Issue 8, 1993, Pages 1149-1151
Optimization of YBa2Cu3O7-δ submicrometer structure fabrication
Author keywords

[No Author keywords available]
Indexed keywords

EID: 0009181146     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.109807     Document Type: Article
Times cited : (24)
References (11)
  • 6
    • 84950578649 scopus 로고    scopus 로고
    • Details concerning SNMS sputtering will be discussed in two forthcoming publications. They will cover questions related to the use of mass spectrometry for end-point detection, (unpublished) and the problem of electrical charge buildup on highly resistive substrates [C. Jaekel, R. Barth, H. G. Roskos, A. Hupfer, and H. Kurz (unpublished)].
    • Jaekel, C.1    Barth, R.2    Roskos, H.G.3    Kurz, H.4
  • 7
    • 84950578650 scopus 로고    scopus 로고
    • The [formula omitted] measurements are performed at current densities which reach about [formula omitted] in the smallest structures. The comparatively high currents are needed for sufficient signal-to-noise ratio.
  • 9
    • 84950578651 scopus 로고    scopus 로고
    • The plasma annealing parameters are not yet optimized. Significantly shorter oxidation times should be possible.
  • 10
    • 84950578652 scopus 로고    scopus 로고
    • In a similar way, plasma oxidation improves the specific resistance ρ of the YBCO bridges in the normal state. For all linewidths [formula omitted] ρ after plasma oxidation has a value of [formula omitted] close to the [formula omitted] of native films.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.