Influence of the deposition parameters controlled by OES on PZT thin film properties deposited by RF magnetron sputtering

Ferroelectrics

Volumn 225, Issue 1-4, 1999, Pages 229-236

  Ayguavives, F ^a   Ea Kim, B ^a   Agius, B ^a  

^a UNIV PARIS SUD   (France)

Author keywords

Chemical composition; Emission spectroscop; PZT films; Reactive sputtering

Indexed keywords

EID: 0009115470     PISSN: 00150193     EISSN: None     Source Type: Journal    
DOI: 10.1080/00150199908009130     Document Type: Article

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