Depth profile of tritium in plasma exposed CX-2002U

Journal of Nuclear Materials

Volumn 283-287, Issue PART II, 2000, Pages 1048-1052

  Tadokoro, T ^a   Isobe, K ^a   O'hira, S ^a   Shu, W ^a   Nishi, M ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009073268     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(00)00317-2     Document Type: Article

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