The influence of substrate temperature, substrate material and heat treatment on the micro structure of Ag/Si nanocomposite films prepared by r.f. co-sputtering

Materials Science and Engineering: A

Volumn 226-228, Issue , 1997, Pages 161-167

  Niu, F ^a   Chang, I T H ^a,b   Dobson, P J ^a   Cantor, B ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

Co sputtering; Heat treatment; Nanocomposite thin film; Transmission electron microscopy

Indexed keywords

AMORPHOUS SILICON; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; HEAT TREATMENT; HIGH TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; SEGREGATION (METALLOGRAPHY); SILVER; SPUTTER DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

NANOCOMPOSITE THIN FILMS;

METALLIC FILMS;

EID: 0009044467     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(97)80034-2     Document Type: Article

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