Monitoring arsine in the semiconductor industry

SSA Journal: Journal of the Semiconductor Safety Association

Volumn 14, Issue 4, 2000, Pages 31-35

  O'Brien, Margaret E ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009000205     PISSN: 1084578X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

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11. National Institute for Occupational Safety and Health: Criteria for a Recommended Standard-Occupational Exposure to Inorganic Arsenic. DHEW (NIOSH) Pub. No. 75-149 NIOSH, Cincinnati, OH (1975).
12. Blair, P.C.; Morrow, T.B.; Morrissey, R.E.; et al.: Comparative Toxicity of Arsine Gas in B6C3F1 Mice, Fischer 344 Rats, and Syrian Golden Hamsters: System Organ Studies and Comparison of Clinical Indices of Exposure. Fundamental and Applied Toxicology. 14:776-787 (1990).
13. Documentation for Immediately Dangerous to Life and Health Concentrations. NIOSH CHEMICAL LISTING AND DOCUMENTATION OF REVISED IDLH VALUES. http://www.cdc.gov/niosh/idlh/7784421.html. (1995).
14. Uniform Fire Code, Article 51, Semiconductor Fabrication Facilities Using Hazardous Production Materials. (1997).
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