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Volumn 36, Issue 5, 1997, Pages 1408-1413

Single crystal silicon supported thin film micromirrors for optical applications

Author keywords

Mechanical polishing; Micro opto electro mechanical systems; Micromirrors; Planarization; Single crystal silicon; Single crystal silicon reactive etching and metallization; Vertical actuators

Indexed keywords


EID: 0008968081     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.601349     Document Type: Article
Times cited : (10)

References (13)
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  • 2
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  • 3
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    • Two dimensional silicon micromachined optical scanner integrated with photo detector
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    • (1995) Proc. Transducers '95 , pp. 308-311
    • Honer, K.A.1    Haluf, N.I.2    Martinez, E.3    Kovacs, G.T.A.4
  • 8
  • 9
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    • Micromachined 50 μm×250 μm silicon torsional mirror arrays for optical signal processing
    • P. Hsiang, N. Garcia-Valenzula, and M. Tabib-Azar, "Micromachined 50 μm×250 μm silicon torsional mirror arrays for optical signal processing," Proc. SPIE 1793, 190-197 (1992).
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  • 10
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  • 11
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    • SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures
    • K. A. Shaw, Z. L. Zhang, and N. C. MacDonald, "SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures," Sensors and Actuators A 40, 63-70 (1994).
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    • Shaw, K.A.1    Zhang, Z.L.2    MacDonald, N.C.3
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.