The use of photoresist for a non-actinic dye in a conventional positive

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 922, Issue , 1988, Pages 217-221

  Sawoska, David A ^a   Sangiacomo, Keith D ^a   Jacovich, Elaine C ^a   Cordes, William F ^a  

^a MacDermid Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL ENGINEERING;

ALIGNMENT SIGNALS; DARK FIELD; DARK FIELD MODES; DESIGN RULES; DETECTION SIGNAL; DYE INTERACTIONS; PROCESS WINDOW; TARGET RECOGNITION;

PHOTORESISTS;

EID: 0008963686     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.968416     Document Type: Conference Paper

References (6)

1. Elliot, David J., Microlithoqraphy: Process Technology for IC Fabrication, McGrawHill 1986.
2. Wolf, Stanley, Tauber, Richard N., Silicon Processing for the VLSI Era, Lattice Press 1986.
3. Kuniyoshi, Shinji, et al, “Contrast Improvement of Alignment Signals from Resist Coated Patterns”, J. Vac. Sci. Technol. B5(2), March/April 1987.
4. Kirk, Chris P., “Theoretical Models for the Optical Alignment of Wafer Steppers”, SPIE Optical Microlithography VI, Vol. 772, p. 134, 1987.
5. Beaulieu, David R., Hellebrakers, Paul P., “Dark Field Technology - A Practical Approach to Local Alignment”, SPIE Optical Microlithography VI, Vol. 772, p. 142, 1987.
6. Stephanakis, Adonis C., Rubin, Daniel I., “Advances in 1:1 Optical Lithography”, SPIE Optical Microlithography VI, Vol. 772, p. 74, 1987