Direct imaging of SiO2 thickness variation on Si using modified atomic force microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 1536-1539

  Mang, K M ^a   Khang, Y ^a   Park, Y J ^a   Kuk, Young ^a   Lee, S M ^b   Williams, C C ^c  

^a Seoul National University   (South Korea)

^b PRINCETON UNIVERSITY   (United States)

^c UNIVERSITY OF UTAH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008602149     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589134     Document Type: Article

References (10)

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