Midinfrared silicon/germanium based photodetection

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1520-1524

  Presting, H ^a   Hepp, M ^b   Kibbel, H ^a   Thonke, K ^b   Sauer, R ^b   Mahlein, M ^c   Cabanski, W ^d   Jaros, M ^e  

^a DAIMLER AG   (Germany)

^b UNIVERSITY OF ULM   (Germany)

^c Center of Applied Energy Research   (Germany)

^d AEG   (Canada)

^e NEWCASTLE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008577411     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589978     Document Type: Article

References (5)

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3. B.-Y. Tsaur, C. K. Chen, and S. Marino, Opt. Eng. (Bellingham) 33, 72 (1994).
4. E. Kasper and K. Wörner, J. Electrochem. Soc. 132, 2481 (1985); H. Kibbel and E. Kasper, Vacuum 41, 929 (1990).
5. E. Kasper and K. Wörner, J. Electrochem. Soc. 132, 2481 (1985); H. Kibbel and E. Kasper, Vacuum 41, 929 (1990).