Surface polarity dependence in step-controlled epitaxy: Progress in SiC epitaxy

Diamond and Related Materials

Volumn 6, Issue 10, 1997, Pages 1276-1281

  Matsunami, Hiroyuki ^a   Kimoto, Tsunenobu ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

C Si ratio dependance; Step bunching; Step controlled epitaxy; Surface polarity dependance

Indexed keywords

EID: 0008544940     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(97)00104-0     Document Type: Article

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