Deep submicron resist profile simulation and characterization of electron beam lithography system for cell projection and direct writing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2313-2317

  Ham, Young Mog ^a,b   Lee, Changbuhm ^a   Kim, Soo Hwan ^a   Chun, Kukjin ^a  

^a Seoul National University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008389149     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589636     Document Type: Article

References (12)

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