Properties of micropatterned ferroelectric thin films fabricated by electron beam exposed chemical solution deposition process

Ferroelectrics

Volumn 232, Issue 1-4, 1999, Pages 15-24

  Okamura, Soichiro ^a   Shiosaki, Tadashi ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Chemical solution deposition; Filling process; Micropatterning; Pb(Zr, Ti)O3; Thin films

Indexed keywords

EID: 0008370059     PISSN: 00150193     EISSN: None     Source Type: Journal    
DOI: 10.1080/00150199908015765     Document Type: Article

References (4)

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2. A. Kakimi, S. Okamura, Y. Yagi, K. Mori and T. Tsukamoto, Jpn. J. Appl. Phys., 33, 5301 (1994).
3. S. Okamura, K. Mori, T. Tsukamoto and T. Shiosaki, Integrated Ferroelectrics, 18, [811]/311 (1997).
4. S. Okamura and T. Shiosaki, to be published in Proc. of 11th IEEE ISAF, (1998).