Optogalvanic detection of oxygen negative ions in reactive sputtering process

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1420-1425

  Matsuda, Y ^a   Shuto, K ^a   Nagamatsu, H ^a   Fujiyama, H ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

Negative ion; Optogalvanic; Oxygen; Photo detachment; Probe; Reactive sputtering; YAG laser

Indexed keywords

EID: 0008359749     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00257-0     Document Type: Article

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