X-ray photoelectron spectroscopy study on native oxidation of As-implanted Si (100)

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 4, 1996, Pages 2707-2711

  Yano, Fumiko ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008191932     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589008     Document Type: Article

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