Measurement of trench depth by infrared interferometry

Optics Letters

Volumn 24, Issue 23, 1999, Pages 1702-1704

  Van Kessel, T ^a   Wickramasinghe, H K ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008092725     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.24.001702     Document Type: Article

References (7)

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2. F. C. Chang, G. S. Kino, W. R. Studenmund, S. S. C. Chim, and C.-H. Chou, Proc. SPIE 1926, 464 (1993).
3. T. R. Corle and G. S. Kino, Confocal Scanning Optical Microscopy and Related Techniques (Academic, San Diego, Calif., 1996).
4. F. C. Chang and G. S. Kino, Appl. Opt. 37, 3471 (1998).
5. N. Balasubramanian, "Optical system for surface topography measurement," U.S. patent 4,340,306 (July 20, 1982).
6. P. de Groot and L. Deck, Opt. Lett. 18, 1462 (1993).
7. H. K. Wickramasinghe, "Method for measuring a trench depth parameter of a material," U.S. patent 5,392,118 (February 21, 1995).