Plasma etching of Cr films in the fabrication of photomasks: II. A comparison of etch technologies and a first look at defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 92-102

  Coleman, Thomas P ^a   Buck, Peter D ^a   Johnson, David J ^b  

^a Etec Systems Inc   (United States)

^b Plasma Therm IP   (United States)

Author keywords

ALTA 3000; Chrome etch; Dry etching; Inductively coupled plasma; Photomask; Plasma etch

Indexed keywords

CHROMIUM; DATA STORAGE EQUIPMENT; DEFECTS; DRY ETCHING; ETCHING; INDUCTIVELY COUPLED PLASMA; LINEARIZATION; PHOTOMASKS; PHOTORESISTS; PLASMA DENSITY; PLASMA ETCHING; PLASMAS; TECHNOLOGY;

ALTA 3000; CD LINEARITIES; CD SHIFTS; CD UNIFORMITIES; CHROME ETCH; CHROMIUM FILMS; CR FILMS; CRITICAL DIMENSION CONTROLS; DEFECT REDUCTIONS; ETCH PROCESSES; ETCH RATES; ETCH UNIFORMITIES; EXPOSURE SYSTEMS; FIRST LOOKS; FOCAL POINTS; ION ENERGIES; LOADING EFFECTS; LOWER PRESSURES; PLASMA ETCH; POSSIBLE SOLUTIONS; REACTIVE IONS; RESIST IMAGES; SYSTEM LOADINGS; WET ETCH PROCESSES;

REACTIVE ION ETCHING;

EID: 0007963637     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262796     Document Type: Conference Paper

References (2)

1. P. Buck, B. Grenon, "A Comparison of Wet and Dry Chrome Etching with the CORE-2564," Proc., 13th Annual Symposium of Photomask Technology and Management, Vol. 2087, (1993).
2. T. Coleman, P. Buck, "Plasma Etching of Chromium Films in the Fabrication of Photomasks," 15th Annual Symposium on Photomask Technology and Management, SPIE Vol. 2621, pp. 62-72.