Effects of deposition rate on the optical and electrical properties of reactively evaporated thin films of indium oxide

Annales de Chimie: Science des Materiaux

Volumn 23, Issue 1-2, 1998, Pages 385-388

  Hakam, A ^a   Banouq, M ^a   Ouboumalk, L ^a   Saidi, Y ^a   Chouiyakh, A ^a  

^a FACULTÉ DES SCIENCES   (Morocco)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007567506     PISSN: 01519107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0151-9107(98)80098-6     Document Type: Article

References (9)

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8. ADDOU (M.), KADIRI (A.), OUAZZANI (M.), HAKAM (A.) and SALARDENNE (J.), J. Chim. Phys. (1991) 88, 343.
9. VAN DER PAUW (L.J.), Philips Research Reports (1958) 13, 1.