Design and performance analysis of a three-dimensional sample translation device used in ultrahigh vacuum scanned probe microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 827-831

  Schlittler, R R ^a   Gimzewski, J K ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007556950     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588723     Document Type: Article

References (13)

1. For a review see: Y. Kuk and P. J. Silverman, Rev. Sci. Instrum. 60, 165 (1989).
2. See From Instrumentation to Nanotechnology, edited by J. W. Gardner and H. T. Hingle (Gordon and Breach, Philadelphia, 1991), Vol. 1.
3. B. V. Corb, M. Ringger, and H.-J. Güntherodt, J. Appl. Phys. 58, 3947 (1985); D. P. E. Smith and S. A. Elrod, Rev. Sci. Instrum. 56, 1970 (1985).
4. B. V. Corb, M. Ringger, and H.-J. Güntherodt, J. Appl. Phys. 58, 3947 (1985); D. P. E. Smith and S. A. Elrod, Rev. Sci. Instrum. 56, 1970 (1985).
5. G. C. Joyce and G. C. Wilson, J. Phys. E: Sci. Instrum. 2, 661 (1969).
6. G. Binnig and H. Rohrer, Helv. Phys. Acta 55, 726 (1982).
7. N. Shimizu, T. Kimura, T. Nakamura, and I. Umebo, J. Vac. Sci. Technol. A 8, 333 (1990).
8. S. Behler, Ph.D. dissertation, University of Basel, Switzerland, 1994.
9. K. Sugihara, I. Mori, T. Tojo, C. Ito, M. Goto, M. Tabata, and T. Shinozaki, Precision Eng. 7, 174 (1985).
10. Inchworm, Burleigh Instruments Inc., New York 144532.
11. D. W. Pohl, Rev. Sci. Instrum. 58, 54 (1987).
12. R. Gaisch, J. K. Gimzewski, B. Reihl, R. R. Schlittler, and M. Tschudy, Ultramicroscopy 42-44, 1621 (1992).
13. Omicron Vakuumphysik, Taunusstein, Germany.