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Volumn 3573, Issue , 1998, Pages 457-460

Blazed holographic diffraction grating fabrication using as2se3 inorganic photoresist

Author keywords

Blazed grating; Holographic diffraction grating; Inorganic photoresist; Spectral device

Indexed keywords

DIFFRACTION; ETCHING; FABRICATION; HOLOGRAPHY; LIGHT; PHOTORESISTS;

EID: 0007232416     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.324564     Document Type: Conference Paper
Times cited : (5)

References (6)
  • 1
    • 36849109539 scopus 로고
    • Production ofblazed holograms
    • N. K. Sheridon, "Production ofblazed holograms". Appl. Phys. Lett. 12(9), 316-318(1968).
    • (1968) Appl. Phys. Lett , vol.12 , Issue.9 , pp. 316-318
    • Sheridon, N.K.1
  • 2
    • 0000854095 scopus 로고
    • Blazed holographic gratings
    • M. Breidne, S. Johansson, L. E. Nilsson, "Blazed holographic gratings". Opt. Acta 26(11), 1427-1441 (1976).
    • (1976) Opt. Acta , vol.26 , Issue.11 , pp. 1427-1441
    • Breidne, M.1    Johansson, S.2    Nilsson, L.E.3
  • 3
    • 0020802536 scopus 로고
    • Diffraction efficiency of blazed holographic gratings
    • L. Mashev and S. Tonchev. "Diffraction efficiency of blazed holographic gratings". Optics Communications 47(1), 5-7(1983).
    • (1983) Optics Communications , vol.47 , Issue.1 , pp. 5-7
    • Mashev, L.1    Tonchev, S.2
  • 5
    • 0026372404 scopus 로고
    • Holographic diffraction gratings on the base of chalcogenide semiconductors
    • I. Z. Indutny, I. I. Robur, P. F. Romanenko, and A. V. Stronski, "Holographic diffraction gratings on the base of chalcogenide semiconductors", Proc. SPIE 1555, 248-257(1991).
    • (1991) Proc. SPIE 1555 , pp. 248-257
    • Indutny, I.Z.1    Robur, I.I.2    Romanenko, P.F.3    Stronski, A.V.4
  • 6
    • 0005247708 scopus 로고
    • Recording of holographic diffraction gratings on lightsensitive semiconductor-metal system
    • I. Z. Indutnyi, M. T. Kostishin, P. F. Romanenko, A. V. Stronski, "Recording of holographic diffraction gratings on lightsensitive semiconductor-metal system". Journ. Jnf Rec. Mater. 19(3), 239-248(1991).
    • (1991) Journ. Inf Rec. Mater , vol.19 , Issue.3 , pp. 239-248
    • Indutnyi, I.Z.1    Kostishin, M.T.2    Romanenko, P.F.3    Stronski, A.V.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.