Electrochemical and XPS measurements on thin oxide films on zirconium

Journal of Electroanalytical Chemistry

Volumn 217, Issue 1, 1987, Pages 159-185

  Meisterjahn, P ^a   Hoppe, H W ^a   Schultze, J W ^a  

^a HEINRICH HEINE UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007087938     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0728(87)85072-6     Document Type: Article

References (59)

1. Zur passivität von Zr in HClO4 und H2SO4
2. �ber die Anwendung von Zirkonium im chemischen Apparatebau
3. The Migration of Metal and Oxygen during Anodic Film Formation
4. The Measurement of Ionic Mobilities in the Anodic Oxides of Tantalum and Zirconium by a Precision Sectioning Technique
5. Optical Energy Gaps in the Monoclinic Oxides of Hafnium and Zirconium and Their Solid Solutions1
6. Cathodic Processes on Passive Zirconium
7. The Reduction of Oxygen on Passive Zirconium
8. Factors Affecting the Growth of Porous Anodic Oxide Films on Zirconium
9. The conditions for incorporation of electrolyte ions into anodic oxides
10. lncorporation of lons in Anodic Oxide Films on Zirconium and Their Effect on Film Behavior
11. The effect of foreign ions upon the electrical characteristics of anodic ZrO2 films
12. The Anodizing of Zirconium and Other Transition Metals in Nitric Acid
13. Die Bewegung der Ionengitter von Isolatoren bei extremen elektrischen Feldst�rken
14. Kinetik der elektrochemischen Bildung und Reduktion von monomolekularen Oxidschichten auf Gold
15. The elctrochemical behaviour of hafnium
16. Valency Changes in the Surface Oxide Films on Metals
17. Inelastische Tunnelprozesse und Halbleitereffekte bei der anodischen Sauerstoffentwicklung an oxidbedecktem Platin
18. Depletion-Layer Photoeffects in Semiconductors