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Volumn 131, Issue 10, 1984, Pages 2443-2446
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Stress Effects in Boron-Implanted Polysilicon Films
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IBM
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0007082430
PISSN: 00134651
EISSN: 19457111
Source Type: Journal
DOI: 10.1149/1.2115314 Document Type: Article |
Times cited : (18)
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References (11)
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