Ion beam synthesis of cobalt disilicide using focused ion beam implantation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2574-2577

  Teichert, J ^a   Bischoff, L ^a   Hausmann, S ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007045340     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590154     Document Type: Article

References (13)

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