AES study of the mass transport of nickel near Ni / Cu (111) interface

Defect and Diffusion Forum

Volumn 156, Issue , 1998, Pages 129-134

  Tokei Zs ^a,b   Beke, D L ^b   Bernardini, J ^a   Rolland, A ^a  

^a AIX MARSEILLE UNIVERSITY   (France)

^b UNIVERSITY OF DEBRECEN   (Hungary)

Author keywords

AES; Copper; Diffusion; Interface; Mass Transport; Nickel

Indexed keywords

EID: 0006931231     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.156.129     Document Type: Article

References (7)

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5. K.J.Anusa Vice, R T. de Hoff, Metall. Trans. 3 (1972) p. 1279.
6. C.A.Mackleit, Phys. Rev. 121 (1958) p.1649.
7. Zs.Tokei, D.L.Beke, J Bernardini and A. Rolland (to be published).