-
1
-
-
84957276753
-
-
W.L. Ahlgren, S.M. Johnson, E.J. Smith, R.P. Ruth, B.C. Johnston, M.H. Kalisher, C.A. Cockrum, T.W. James, D.L. Arney, C.K. Ziegler and W. Lick, J. Vac. Sci. Technol. A 7, 331 (1989).
-
(1989)
J. Vac. Sci. Technol. A
, vol.7
, pp. 331
-
-
Ahlgren, W.L.1
Johnson, S.M.2
Smith, E.J.3
Ruth, R.P.4
Johnston, B.C.5
Kalisher, M.H.6
Cockrum, C.A.7
James, T.W.8
Arney, D.L.9
Ziegler, C.K.10
Lick, W.11
-
3
-
-
0027643761
-
-
S.M. Johnson, J.A. Vigil, J.B. James, C.A. Cockrum, W.H. Konkel, M.H. Kalisher, R.F. Risser, T. Tung, W.J. Hamilton, W.L. Ahlgren and J.M. Myrosznyk, J. Electron. Mater. 22, 835 (1993).
-
(1993)
J. Electron. Mater.
, vol.22
, pp. 835
-
-
Johnson, S.M.1
Vigil, J.A.2
James, J.B.3
Cockrum, C.A.4
Konkel, W.H.5
Kalisher, M.H.6
Risser, R.F.7
Tung, T.8
Hamilton, W.J.9
Ahlgren, W.L.10
Myrosznyk, J.M.11
-
4
-
-
0028761979
-
-
L. Sugiura, K. Shigenaka, F. Nakata and K. Hirahara, J. Cryst. Growth 145, 547 (1994).
-
(1994)
J. Cryst. Growth
, vol.145
, pp. 547
-
-
Sugiura, L.1
Shigenaka, K.2
Nakata, F.3
Hirahara, K.4
-
5
-
-
84956272511
-
-
L. Sugiura, K. Shigenaka, F. Nakata and K. Hirahara, Jpn. J. Appl. Phys. 32, 669 (1993).
-
(1993)
Jpn. J. Appl. Phys.
, vol.32
, pp. 669
-
-
Sugiura, L.1
Shigenaka, K.2
Nakata, F.3
Hirahara, K.4
-
6
-
-
30244448425
-
-
Ext. Abs., Seattle
-
K. Yasuda, M. Ohno, J. Yamaguchi, T. Onakado, T. Ferid and H. Hatano, Ext. Abs., 1993 U.S. Workshop Phys. Chem. HgCdTe (Seattle, 1993), p. 27.
-
(1993)
1993 U.S. Workshop Phys. Chem. HgCdTe
, pp. 27
-
-
Yasuda, K.1
Ohno, M.2
Yamaguchi, J.3
Onakado, T.4
Ferid, T.5
Hatano, H.6
-
7
-
-
85033823110
-
Proc. 11th Intl. Conf. Crystal Growth
-
Hague (in press)
-
K. Yasuda, H. Hatano, T. Ferid, M. Minamide, T. Maejima and K. Kawamoto, Proc. 11th Intl. Conf. Crystal Growth (1995 Hague), J. Cryst. Growth (in press).
-
(1995)
J. Cryst. Growth
-
-
Yasuda, K.1
Hatano, H.2
Ferid, T.3
Minamide, M.4
Maejima, T.5
Kawamoto, K.6
-
8
-
-
0041186767
-
-
Tokyo
-
K. Yasuda, S. Sone, M. Ekawa, Y. Sugiura, N. Matsui, A. Tanaka and M. Saji, Tech. Digest, 1st Intl. Mtg. Advanced Proc. Character. Technol. (APCT '89) (Tokyo, 1989), p. 131.
-
(1989)
Tech. Digest, 1st Intl. Mtg. Advanced Proc. Character. Technol. (APCT '89)
, pp. 131
-
-
Yasuda, K.1
Sone, S.2
Ekawa, M.3
Sugiura, Y.4
Matsui, N.5
Tanaka, A.6
Saji, M.7
-
9
-
-
0011825773
-
-
S. Sone, M. Ekawa, K. Yasuda, Y. Sugiura and A. Tanaka, Appl. Phys. Lett. 56, 539 (1990).
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 539
-
-
Sone, S.1
Ekawa, M.2
Yasuda, K.3
Sugiura, Y.4
Tanaka, A.5
-
13
-
-
0029308922
-
-
S.M. Johnson, T.J. de Lyon, C.A. Cockrum, W.J. Hamilton, T. Tung, F.I. Gesswein, B.A. Baumgratz, L.M. Ruzicka, O.K. Wu and J.A. Roth, J. Electron. Mater. 24, 467 (1995).
-
(1995)
J. Electron. Mater.
, vol.24
, pp. 467
-
-
Johnson, S.M.1
De Lyon, T.J.2
Cockrum, C.A.3
Hamilton, W.J.4
Tung, T.5
Gesswein, F.I.6
Baumgratz, B.A.7
Ruzicka, L.M.8
Wu, O.K.9
Roth, J.A.10
-
14
-
-
0000485317
-
-
R.D. Feldman, R.F. Austin, A.H. Dayem and E.H. Westerwick, Appl. Phys. Lett. 49, 797 (1986).
-
(1986)
Appl. Phys. Lett.
, vol.49
, pp. 797
-
-
Feldman, R.D.1
Austin, R.F.2
Dayem, A.H.3
Westerwick, E.H.4
|