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Journal of Applied Physics

Volumn 64, Issue 6, 1988, Pages 3215-3223

Production of high-quality amorphous silicon films by evaporative silane surface decomposition

(5) Doyle, J a Robertson, R a Lin, G H a He, M Z a Gallagher, A a

a UNIVERSITY OF COLORADO (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006834059 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.341539 Document Type: Article

Times cited : (184)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.