Focused Ion Beam (FIB) Milling Damage Formed During Tem Sample Preparation of Silicon

Microscopy and Microanalysis

Volumn 4, Issue , 1998, Pages 656-657

  Susnitzky, David W ^a   Johnson, Kevin D ^b  

^a INTEL CORPORATION   (United States)

^b Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006830481     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927600023400     Document Type: Conference Paper

References (2)

1. D.P. Basile, et.al., Proc. Mat. Res. Soc. Symp. (254) 23 (1992).
2. J.F. Walker and R.F. Broom, Inst. Phys. Conf. Ser. (1997) in press.