Reversible variation of donor concentrations in high-purity InP by thermal treatment

Journal of Applied Physics

Volumn 87, Issue 6, 2000, Pages 2885-2889

  Kubota, Eishi ^a   Ando, Koshi ^b   Yamada, Syoji ^c  

^a NTT CORPORATION   (Japan)

^b TOTTORI UNIVERSITY   (Japan)

^c Japan Advanced Institute of Science and Technology   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006815751     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372273     Document Type: Article

References (26)

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