Photosensitive polyimides in semiconductor manufacturing

Solid State Technology

Volumn 40, Issue 11, 1997, Pages 151-154

  Culver, Robbyn ^a,b,c  

^a Ultratech Stepper Inc   (United States)

^b UNIVERSITY OF NOTRE DAME   (United States)

^c PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006786539     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. C. Schuckert, et al. IEEE/SEMI Advanced Semiconductor Manufacturing Conference, p. 72 (1990).
2. Horie, Kazuyuki eds., Photosensitive Polyimide - Fundamentals and Applications, Technomic Publishing Co. Inc., 1995.
3. John D. Rose, "Practical Comparison of Photosensitive and NonPhotosensitive Polyimides Used as a Buffer Coat, OCG Microlithography Seminar, Interface '94 Proceedings, p. 269-287, 1994.