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Volumn 40, Issue 11, 1997, Pages 151-154

Photosensitive polyimides in semiconductor manufacturing

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0006786539     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (6)

References (3)
  • 3
    • 0010289027 scopus 로고
    • Practical Comparison of Photosensitive and NonPhotosensitive Polyimides Used as a Buffer Coat
    • John D. Rose, "Practical Comparison of Photosensitive and NonPhotosensitive Polyimides Used as a Buffer Coat, OCG Microlithography Seminar, Interface '94 Proceedings, p. 269-287, 1994.
    • (1994) OCG Microlithography Seminar, Interface '94 Proceedings , pp. 269-287
    • Rose, J.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.