Inexpensive, quickly producable X-ray mask for LIGA

Microsystem Technologies

Volumn 5, Issue 4, 1999, Pages 189-193

  Harris, C ^a   Desta, Y ^a   Kelly, K W ^a   Calderon, G ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006755363     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050162     Document Type: Article

References (11)

1. Ballandras S et al. (1995) Deep etch x-ray lithography using silicon-gold masks fabricated by deep etch UV lithography and electroforming. Micromech Microeng 5:203-208
2. Bley P et al. (1991) Application of the LIGA process in fabrication of three-dimensional mechanical microstructures. Micro process 91, 1991 Int. Microprocess Conf., Kanazawa, Japan, pp 384-389
3. Ehrfeld W et al. (1986) Mask making for synchrotron radiation lithography. Microelectric Eng 5:463-470, North-Holland
4. Ghica V; Glashauser W. Verfahren fur die Spannangsfreie Entwicklung von Bestrahlten Polymethyl-methacrylat-Schichtyen. Offenlegungsschrift DE3039110, Siemens AG, Munich, Germany
5. Gottert J et al. (1998) Lithographic fabrication of graphite-based x-ray masks. 42nd Electron Ion and Photon Beam Technology and Nanofabrication (EIPBN) Conf. Chicago, IL
6. Koester D MCNC; Private communication
7. Lee KY et al. (1995) Micromachining applications of a high resolution ultrathick photoresist. J Vacuum Sci Technol B 13(6):3012-3016
8. Lorenz H et al. (1997) Photoplastic micromechanical components fabricated using optical lithography and sacrificial-layer-lift-off technique. HARMST 1997 Book of Abstacts 1-2, Madison, Wisconsin
9. Malek CK et al. (1996) Masks for high aspect ratio x-ray lithography. Micromech Microeng 6:228-235
10. Schomburg WK et al. (1991) Ti and Be masks with alignment windows for the LIGA process. Microelectronic Eng 13:323-326
11. Sheu JT et al. (1998) Fabrication of intermediate mask for deep x-ray lithography. Microsystem Technologies 4:74-76