Production of size-controlled Si fine particles using pulsed RF discharge

Surface Review and Letters

Volumn 3, Issue 1, 1996, Pages 75-78

  Shiratani, M ^a   Kawasaki, H ^a   Fukuzawa, T ^a   Watanabe, Y ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006751683     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X96000176     Document Type: Article

References (10)

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