High-density plasma dry etch for DUV attenuated phase-shifting masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 228-232

  Peng, Song ^a   Adair, William ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DRY ETCHING; INDUCTIVELY COUPLED PLASMA; LITHOGRAPHY; MOLYBDENUM COMPOUNDS; PLASMA ETCHING; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

HIGH DENSITY PLASMA DRY ETCH; MOLYBDENUM SILICIDE; PHASE CONTROL PERFORMANCE; PHASE SHIFTING MASKS;

MASKS;

EID: 0006653603     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328811     Document Type: Conference Paper

References (4)

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