Phosphorus diffusion from a spin-on doped glass (SOD) source during rapid thermal annealing

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 231-236

  Mathiot, D ^a   Lachiq, A ^a   Slaoui, A ^a   Noel S ^a   Muller, J C ^a   Dubois, C ^b  

^a Phase CNRS   (France)

^b INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006419824     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00045-6     Document Type: Article

References (19)

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