Chromatic monitoring of downstream microwave plasma source

Czechoslovak Journal of Physics

Volumn 50, Issue SUPPL. 3, 2000, Pages 481-486

  Sery M ^a   Spatenka P ^a   Pavlik J ^b   Messelhauser J ^c  

^a UNIVERSITY OF SOUTH BOHEMIA   (Czech Republic)

^b J E PURKINJE UNIVERSITY   (Czech Republic)

^c Plasonic Oberflächentechnik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006328134     PISSN: 00114626     EISSN: 15729486     Source Type: Journal    
DOI: 10.1007/BF03165934     Document Type: Article

References (7)

1. M. Klick, W. Rehak, M. Kammeyer: Jpn. J. Appl. Phys. 36 (1997) 4625.
2. N.St.J. Braithwaite, J.P. Booth, G. Cunge: Plasma Sources Sci. Technol. 5 (1996) 677.
3. P. Špatenka, H.-J. Endress, J. Krumeich, R. Cook: "Process control of plasma poly-merization in a large industrial reactor", Surface and Coating Technology 116-119 (1999)1228.
4. M.M. Gurevitch: Light and its measurement. Izdatelstvo Akademii Nauk SSSR, Moskva, 1950 (in Russian).
5. I. Khandaker, E. Glavas, K. Morse, S. Moruzzi, G.R. Jones: Vacuum 45 (1994) 109.
6. H. Wittrich, W. John, L. Weixelbaum, P. Kember: "Optische Kontrolle von Ätzplasmen mittels Farbmessung", in 7. Bundesdeutsche Fachtagung Plasmatechnologie, Bochum, Germany, 1996 (in German).
7. M. Šerý, P. Špatenka, J. Messelhäuser, H. Marek: "Einfache Methode zur Bestimmung der eingespeisten Leistung im Plasma", in 7. Bundesdeutsche Fachtagung Plasmatechnologie, Bochum, Germany, 1996 (in German).