Oxygen distribution in Czochralski silicon melts measured by an electrochemical oxygen sensor

Materials Science and Engineering B

Volumn 36, Issue 1-3, 1996, Pages 46-49

  Seidl, A ^a   Marten, R ^a   Muller G ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Ionic conduction; Oxygen; Silicon

Indexed keywords

EID: 0006219089     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(95)01263-X     Document Type: Article

References (14)

1. W. Zulehner, in H.R. Huff, K.G. Barraclough and J. Chikawa (eds.), Semiconductor Silicon 1990, Electrochemical Society, Pennington, NJ, 1990, p. 30.
2. N. Riley, J. Cryst. Growth, 97 (1989) 76.
3. K.M. Kim and W.E. Langlois, in H.R. Huff, K.G. Barraclough and J. Chikawa (eds.), Semiconductor Silicon 1990. Electrochemical Society, Pennington, NJ, 1990, p. 81.
4. H. Hirata and K. Hoshikawa, J. Cryst. Growth, 125 (1992) 181.
5. T.A. Kinney and R.A. Brown, J. Cryst. Growth, 126 (1993) 413.
6. S. Togawa, A. Yokotani, S. Kimura, Y. Shiraishi and M. Imai, in H.R. Huff, W. Bergholz and K. Sumino (eds.), Semiconductor Silicon 1994, Electrochemical Society, Pennington, NJ, 1994, p. 90.
7. A. Seidl, R. Marten and G. Müller, J. Electrochem. Soc., 141 (1994) 2564.
8. A. Seidl, R. Marten and G. Müller, submitted to the 11th Int. Conf. on Crystal Growth, Den Haag, 1995.
9. T. Takahashi (ed.), High Conductivity Solid Ionic Conductors, World Scientific, Singapore, 1990.
10. K.S. Gotó, Solid State Electrochemistry and its Applications to Sensors and Electronic Devices, Elsevier, Amsterdam, 1988.
11. I. Barin, Thermochemical Data of Pure Substances, VCH, Weinheim, 1989.
12. Y. Kishida, M. Tanaka and H. Esaka, J. Cryst. Growth, 130 (1993) 75.
13. A. Seidl, G.McCord, G. Müller and H.-J. Leister, J. Cryst. Growth, 137 (1994) 326.
14. K. Kakimoto, M. Watanabe, M. Eguchi and T. Hibiya, J. Cryst. Growth, 139 (1994) 197.