Structural characterization of ordered SiGe films grown on Ge(100) and Si(100) substrates

Journal of Applied Physics

Volumn 80, Issue 7, 1996, Pages 3804-3807

  Araki, T ^a   Fujimura, N ^a   Ito, T ^a   Wakahara, A ^b   Sasaki, A ^b  

^a Osaka Prefecture University   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006215375     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363333     Document Type: Article

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