Mechanism of composition change in sputter deposition of barium ferrite films with sputtering gas pressure

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 6250-6252

  Suzuki, E ^a   Hoshi, Y ^a   Naoe, M ^b  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006200014     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367803     Document Type: Article

References (5)

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2. M. Naoe, S. Hasunuma, Y. Hoshi, and Y. Yamanaka, IEEE Trans. Magn. 17, 3184 (1981).
3. T. Motohiro, J. Vac. Sci. Technol. 4, 189 (1986).
4. G. M. Turner, I. S. Falconer, B. W. James, and D. R. McKenzie, J. Appl. Phys. 65, 3671 (1989).
5. M. W. Thompson, Philos. Mag. 18, 377 (1968).