Miniature quadrupole residual gas analyzer for process monitoring at milliTorr pressures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1157-1162

  Holkeboer, D H ^a   Karandy, T L ^a   Currier, F C ^a   Frees, L C ^a   Ellefson, R E ^a  

^a Leybold Inficon   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006156938     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581251     Document Type: Article

References (11)

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